On June 5, PRINANO and Licetec launched a mass production project using the vacuum‑pressure wafer‑level nanoimprint lithography system PL‑AS and a proprietary two‑layer imprint resist process, successfully producing 8‑inch optical chips at one‑tenth the cost of traditional DUV lithography.

The PL‑AS achieves sub‑10nm line‑width resolution, <0.5% pressure uniformity across the wafer, and supports zero‑residual‑layer imprinting with alignment accuracy down to 100nm. It works on flat or curved substrates and with hard or flexible templates. RLT variation is within 2nm , delivering better throughput than Canon’s step‑and‑repeat nanoimprint systems. By eliminating expensive DUV optics and using durable composite templates, the system significantly lowers both equipment and consumable costs.

ICgoodFind: PRINANO’s gas‑pressure nanoimprint platform breaks DUV dependency – a cost breakthrough for 8‑inch optical wafer mass production.